Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

《Plasma Chemistry And Plasma Processing》是一本由SPRINGER出版商出版的专业工程技术期刊，该刊创刊于1981年，刊期Quarterly，该刊已被国际权威数据库SCIE、SCI收录。在中科院最新升级版分区表中，该刊分区信息为大类学科：工程技术 3区，小类学科：工程：化工 3区；物理：应用 3区；物理：流体与等离子体 3区；在JCR（Journal Citation Reports）分区等级为Q2。该刊发文范围涵盖工程：化工等领域，旨在及时、准确、全面地报道国内外工程：化工工作者在该领域取得的最新研究成果、工作进展及学术动态、技术革新等，促进学术交流，鼓励学术创新。2021年影响因子为3.337，平均审稿速度较慢,6-12周。